The processes used for the growth of single crystals usually involve highly complex fluid and heat transport phenomena. Understanging these phenomena and their effects on crystal growth is of vital importance for the design and construction of equipment and the optimization and control of the manufacturing processes.
Collaborating with our university and industrial partners in the DARPA/AFOSR Consortium for Crystal Growth Research, we are developing a parallel code for the realistic simulation of growth processes of Silicon and Indium Phosphide.
The group at AMS involved in this project consists of Wing Chui, William Garber, James Glimm, and Folkert Tangerman.
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